Invention Grant
US08334983B2 Lithographic apparatus and device manufacturing method 有权
平版印刷设备和器件制造方法

Lithographic apparatus and device manufacturing method
Abstract:
A lithographic apparatus is provided with an optical encoder measurement system having an irradiation system to direct an irradiation beam to a first scale. The system has optics to direct a primary diffracted beam diffracted from the first scale upon irradiation by the irradiation beam to a second scale and a detector to detect a secondary diffracted beam after interference and a second diffraction of the primary diffracted irradiation beam on the second scale to measure the position of the first scale with respect to the second scale.
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