Invention Grant
- Patent Title: Self aligning non contact shadow ring process kit
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Application No.: US11870285Application Date: 2007-10-10
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Publication No.: US08342119B2Publication Date: 2013-01-01
- Inventor: Joseph Yudovsky , Lawrence C. Lei , Salvador Umotoy , Tom Madar , Girish Dixit , Gwo-Chuan Tzu
- Applicant: Joseph Yudovsky , Lawrence C. Lei , Salvador Umotoy , Tom Madar , Girish Dixit , Gwo-Chuan Tzu
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/458
- IPC: C23C16/458

Abstract:
The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.
Public/Granted literature
- US20080072823A1 SELF ALIGNING NON CONTACT SHADOW RING PROCESS KIT Public/Granted day:2008-03-27
Information query
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