Invention Grant
- Patent Title: Method of making a CIG target by die casting
- Patent Title (中): 通过压铸制造CIG靶的方法
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Application No.: US12588579Application Date: 2009-10-20
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Publication No.: US08342229B1Publication Date: 2013-01-01
- Inventor: Abdelouahab Ziani , Daniel R. Juliano
- Applicant: Abdelouahab Ziani , Daniel R. Juliano
- Applicant Address: US CA Santa Clara
- Assignee: MiaSole
- Current Assignee: MiaSole
- Current Assignee Address: US CA Santa Clara
- Agency: The Marbury Law Group PLLC
- Main IPC: B22D17/08
- IPC: B22D17/08 ; B22D19/04
Abstract:
A method of making a sputtering target includes providing a backing structure, and forming a die cast copper indium gallium sputtering target material on the backing structure.
Information query
