Invention Grant
- Patent Title: Off-state light baffle for digital projection
- Patent Title (中): 用于数字投影的非状态挡光板
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Application No.: US12770081Application Date: 2010-04-29
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Publication No.: US08342690B2Publication Date: 2013-01-01
- Inventor: Jesse J. Coleman , James Mazzarella , James R. Kircher
- Applicant: Jesse J. Coleman , James Mazzarella , James R. Kircher
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent Kevin E. Spaulding
- Main IPC: G03B21/26
- IPC: G03B21/26

Abstract:
A light modulation assembly for a digital projection apparatus comprising: a solid-state light source that provides an illumination beam; a spatial light modulator having a plurality of tiltable micro-mirrors, each micro-mirror being actuable to tilt with respect to a tilt axis between a first tilt position that provides on-state light and a second tilt position that provides off state light, and wherein the micro-mirrors deflect the illumination beam along an arced path defining a deflection plane as they are tilted between the first tilt position and the second tilt position; and a light baffle disposed alongside the optical axis and in the path of the off state light from the micro-mirrors, the light baffle having a light-trapping surface adapted to absorb the off-state light from the micro-mirrors on the spatial light modulator, the light-trapping surface having a plurality of protruding fins that extend outward from the light-trapping surface at an oblique angle.
Public/Granted literature
- US20110267550A1 OFF-STATE LIGHT BAFFLE FOR DIGITAL PROJECTION Public/Granted day:2011-11-03
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