Invention Grant
- Patent Title: Single crystal growth method and single crystal pulling apparatus for improving yield and productivity of single crystal
- Patent Title (中): 用于提高单晶产量和生产率的单晶生长方法和单晶拉制装置
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Application No.: US12449878Application Date: 2008-02-28
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Publication No.: US08343275B2Publication Date: 2013-01-01
- Inventor: Yuuichi Miyahara , Atsushi Iwasaki , Tetsuhiro Oda
- Applicant: Yuuichi Miyahara , Atsushi Iwasaki , Tetsuhiro Oda
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee: Shin-Etsu Handotai Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-097096 20070403
- International Application: PCT/JP2008/000381 WO 20080228
- International Announcement: WO2008/120435 WO 20081009
- Main IPC: C30B15/22
- IPC: C30B15/22

Abstract:
The present invention resides in a silicon single crystal growth method of pulling up and growing a single crystal from a melt of a silicon raw material in a quartz crucible based on a Czochralski method, wherein the method comprises the steps of: applying a DC voltage between an outer wall of the quartz crucible acts as a positive electrode and a pulling wire or pulling shaft for pulling up the silicon single crystal acts as a negative electrode; and fixing an electric current flowing through the silicon single crystal over a period of time for pulling up the single crystal, to grow the single crystal; as well as a pulling apparatus therefor.
Public/Granted literature
- US20100126408A1 SINGLE CRYSTAL GROWTH METHOD AND SINGLE CRYSTAL PULLING APPARATUS Public/Granted day:2010-05-27
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