Invention Grant
- Patent Title: High-temperature ionic state compound crystallization technology
- Patent Title (中): 高温离子态复合结晶技术
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Application No.: US12487625Application Date: 2009-06-18
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Publication No.: US08343276B2Publication Date: 2013-01-01
- Inventor: Haibiao Wang , Tetsunori Kunimune , Cecilia Wang
- Applicant: Haibiao Wang , Tetsunori Kunimune , Cecilia Wang
- Main IPC: C30B23/00
- IPC: C30B23/00 ; C30B25/00 ; C30B28/12 ; C30B28/14 ; C30B35/00 ; C30B11/00

Abstract:
The present invention provides a high-temperature ionic state fluidized bed compound crystallization technology and an internal reactor structure thereof. The principle of the present invention is that reaction gas is effected by a group of high-frequency external magnetic fields and forms the high-temperature gaseous ion in the first quartz vacuum tube, then forms ion deposition diffusion in the second quartz vacuum tube preheated at constant temperature. As a result, other high-temperature gaseous ions except the silicon hydride are decomposed, rapidly deposited and crystallized in the ion diffusion chamber. And the un-decomposed silicon hydride gas is directly poured into the surface of the silicon heating body of the compound fluidized bed by the static negative high-voltage quartz spray hole to decompose and crystallize, or crystallize by a way of fluid state in the arched heating quartz tube communicating with the top of two quartz reaction furnaces.
Public/Granted literature
- US20100320075A1 High-Temperature Ionic State Compound Crystallization Technology Public/Granted day:2010-12-23
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