Invention Grant
- Patent Title: In situ cleaning of CVD System exhaust
- Patent Title (中): CVD系统排气的原位清洗
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Application No.: US12244318Application Date: 2008-10-02
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Publication No.: US08343317B2Publication Date: 2013-01-01
- Inventor: David K. Carlson
- Applicant: David K. Carlson
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Diehl Servilla LLC
- Main IPC: B01J19/08
- IPC: B01J19/08
Abstract:
Embodiments of the invention relate to methods and apparatuses for forming films using CVD. One or more method and apparatus embodiments include preventing the formation of bonds and/or breaking bonds that permit polymers to form in an exhaust line of a CVD apparatus.
Public/Granted literature
- US20090044699A1 In Situ Cleaning of CVD System Exhaust Public/Granted day:2009-02-19
Information query
