Invention Grant
US08343363B1 Method and system for fabricating a cavity in a substrate of a magnetic recording head
有权
用于在磁记录头的衬底中制造空腔的方法和系统
- Patent Title: Method and system for fabricating a cavity in a substrate of a magnetic recording head
- Patent Title (中): 用于在磁记录头的衬底中制造空腔的方法和系统
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Application No.: US12721218Application Date: 2010-03-10
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Publication No.: US08343363B1Publication Date: 2013-01-01
- Inventor: Chupong Pakpum , Laddawan Supadee
- Applicant: Chupong Pakpum , Laddawan Supadee
- Applicant Address: US CA Fremont
- Assignee: Western Digital (Fremont), LLC
- Current Assignee: Western Digital (Fremont), LLC
- Current Assignee Address: US CA Fremont
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
A method for fabricating an air-bearing surface (ABS) in a substrate having a surface is described. The substrate is for a magnetic recording head. The method includes providing a mask on the surface of substrate. The mask has an edge adjacent to a portion of the substrate exposed by the mask. The method also includes forming a taper in the portion of the substrate adjacent to the edge. The taper has an angle from the surface of the substrate of at least thirty degrees and not more than seventy degrees. The method also includes performing a reactive ion etching (RIE) to remove the portion of the substrate to form a cavity in the substrate. The angle of the taper is configured to substantially eliminated redeposition from the RIE on the edge.
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