Invention Grant
- Patent Title: Monitoring system based on etching of metals
- Patent Title (中): 基于金属蚀刻的监控系统
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Application No.: US12478232Application Date: 2009-06-04
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Publication No.: US08343437B2Publication Date: 2013-01-01
- Inventor: Gordhanbhai N Patel
- Applicant: Gordhanbhai N Patel
- Applicant Address: US NJ Middlesex
- Assignee: JP Laboratories, Inc.
- Current Assignee: JP Laboratories, Inc.
- Current Assignee Address: US NJ Middlesex
- Agent Joseph T Guy; Barbara V. Maurer
- Main IPC: G01N21/75
- IPC: G01N21/75 ; G01N31/00 ; C23C16/52

Abstract:
Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals. These devices have capabilities of producing a long and sharp induction period of an irreversible visual change. The devices are composed of an indicator comprising a very thin layer of a metal and an activator, e.g., a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator. Ink formulations composed of a metal powder and a proper activator can be used for monitoring several sterilization processes, such as sterilization with steam. When water is used as an activator, a thin layer of metals, such as that of aluminum can be used as steam sterilization or humidity indicator.
Public/Granted literature
- US20090301382A1 Monitoring System Based on Etching of Metals Public/Granted day:2009-12-10
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