Invention Grant
- Patent Title: Norbornene polymer comprising photoreactive functional group having halogen substituent group, process for preparing the same, and alignment layer using the same
- Patent Title (中): 包含具有卤素取代基的光反应性官能团的降冰片烯聚合物,其制备方法和使用其的取向层
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Application No.: US13123444Application Date: 2010-01-12
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Publication No.: US08343597B2Publication Date: 2013-01-01
- Inventor: Dong-Woo Yoo , Sung-Ho Chun , Dai-Seung Choi , Young-Chul Won
- Applicant: Dong-Woo Yoo , Sung-Ho Chun , Dai-Seung Choi , Young-Chul Won
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2009-0002316 20090112; KR10-2010-0002496 20100112
- International Application: PCT/KR2010/000171 WO 20100112
- International Announcement: WO2010/080010 WO 20100715
- Main IPC: C08K19/00
- IPC: C08K19/00 ; C08F2/50 ; C08F4/80 ; C08F110/14 ; C08F210/14

Abstract:
The present invention relates to a photoreactive norbornene polymer comprising a photoreactive norbornene monomer, a process for preparing the same, and an alignment layer using the same. The photoreactive norbornene polymer includes a photoreactive functional group having a halogen, in particular, a fluorine substituent group so that it gives a compositional gradient in the alignment layer to improve an orientation rate, an orientation, and an adhesion property.
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