Invention Grant
US08343693B2 Focus test mask, focus measurement method, exposure method and exposure apparatus
有权
聚焦测试面膜，聚焦测量方法，曝光方法和曝光设备
- Patent Title: Focus test mask, focus measurement method, exposure method and exposure apparatus
- Patent Title (中): 聚焦测试面膜，聚焦测量方法，曝光方法和曝光设备
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Application No.: US12940292Application Date: 2010-11-05
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Publication No.: US08343693B2Publication Date: 2013-01-01
- Inventor: Shigeru Hirukawa , Shinjiro Kondo
- Applicant: Shigeru Hirukawa , Shinjiro Kondo
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2009-253785 20091105
- Main IPC: G03F1/26
- IPC: G03F1/26 ; G03F1/44
Abstract:
A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the −X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the −X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
Public/Granted literature
- US20110212389A1 FOCUS TEST MASK, FOCUS MEASUREMENT METHOD, EXPOSURE METHOD AND EXPOSURE APPARATUS Public/Granted day:2011-09-01
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