Invention Grant
- Patent Title: Process for making microelectronic element chips
-
Application No.: US12291974Application Date: 2008-11-17
-
Publication No.: US08343807B2Publication Date: 2013-01-01
- Inventor: Vladimir Anatolyevich Aksyuk , Nagesh R Basavanhally , Avinoam Kornblit , Warren Yiu-Cho Lai , Joseph Ashley Taylor , Robert Francis Fullowan
- Applicant: Vladimir Anatolyevich Aksyuk , Nagesh R Basavanhally , Avinoam Kornblit , Warren Yiu-Cho Lai , Joseph Ashley Taylor , Robert Francis Fullowan
- Applicant Address: FR Paris
- Assignee: Alcatel Lucent
- Current Assignee: Alcatel Lucent
- Current Assignee Address: FR Paris
- Agent Jay M. Brown
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L23/535

Abstract:
Apparatus including a chip substrate having a first chip surface facing away from a second chip surface; an array of microelectronic elements on the first chip surface; and an array of conductors each in communication with one of the microelectronic elements, the conductors passing through the chip substrate and fully spanning a distance between the first and second chip surfaces. Process including: providing an apparatus including a chip substrate having a first chip surface facing away from a second chip surface, an array of microelectronic elements being on the first chip surface, an array of conductors each being in communication with one of the microelectronic elements and partially spanning an average distance between the first and second chip surfaces; bonding a temporary support carrier onto the array of microelectronic elements; removing a portion of the chip substrate, thereby reducing the average distance between the first and second chip surfaces; and forming an under bump metallization pad at the second chip surface in electrical communication with a conductor.
Public/Granted literature
- US20090075424A1 Process for making microelectronic element chips Public/Granted day:2009-03-19
Information query
IPC分类: