Invention Grant
US08344152B2 Process for producing pyridylethylthio compound, modified ion exchanger and process for producing the same, and process for producing bisphenol compound
有权
吡啶基乙硫基化合物的制造方法，改性离子交换剂及其制造方法以及双酚化合物的制造方法
- Patent Title: Process for producing pyridylethylthio compound, modified ion exchanger and process for producing the same, and process for producing bisphenol compound
- Patent Title (中): 吡啶基乙硫基化合物的制造方法，改性离子交换剂及其制造方法以及双酚化合物的制造方法
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Application No.: US11214039Application Date: 2005-08-30
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Publication No.: US08344152B2Publication Date: 2013-01-01
- Inventor: Hideto Hayashi , Koichi Hayashi
- Applicant: Hideto Hayashi , Koichi Hayashi
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Chemical Corporation
- Current Assignee: Mitsubishi Chemical Corporation
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2003-204361 20030731; JP2004-051424 20040226
- Main IPC: C07D213/00
- IPC: C07D213/00
Abstract:
The present invention relates to a process for producing a pyridylethylthio compound which is improved in yield of the pyridylethylthio compound. In a process for producing a pyridylethylthio compound by reacting vinyl pyridine with a sulfur-containing compound, vinyl pyridine used contains a compound represented by the general formula (1): (wherein R1 and R2 are any of combination of isopropenyl group and a hydrogen atom, combination of 1-propenyl group and a hydrogen atom, combination of 2-propenyl group and a hydrogen atom, and combination of methyl group and vinyl group), in an amount of not more than 4% by weight.
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