Invention Grant
- Patent Title: Use of beam deflection to control an electron beam wire deposition process
- Patent Title (中): 使用光束偏转来控制电子束丝沉积过程
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Application No.: US12751075Application Date: 2010-03-31
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Publication No.: US08344281B2Publication Date: 2013-01-01
- Inventor: Karen M. Taminger , William H. Hofmeister , Robert A. Hafley
- Applicant: Karen M. Taminger , William H. Hofmeister , Robert A. Hafley
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee Address: US DC Washington
- Agent Robin W. Edwards; Andrea Z. Warmbier; Jennifer L. Riley
- Main IPC: B23K15/00
- IPC: B23K15/00

Abstract:
A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.
Public/Granted literature
- US20100270274A1 Use of Beam Deflection to Control an Electron Beam Wire Deposition Process Public/Granted day:2010-10-28
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