Invention Grant
- Patent Title: Technique for monitoring and controlling a plasma process with an ion mobility spectrometer
- Patent Title (中): 用离子迁移谱仪监测和控制等离子体工艺的技术
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Application No.: US12556592Application Date: 2009-09-10
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Publication No.: US08344318B2Publication Date: 2013-01-01
- Inventor: Kamal Hadidi , Bernard G. Lindsay
- Applicant: Kamal Hadidi , Bernard G. Lindsay
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01L21/66
- IPC: H01L21/66
Abstract:
A plasma processing apparatus includes a process chamber, a platen positioned in the process chamber for supporting a workpiece, a source configured to generate a plasma in the process chamber, and a monitoring system including an ion mobility spectrometer configured to monitor a condition of the plasma. A monitoring method including generating a plasma in a process chamber of a plasma processing apparatus, supporting a workpiece on a platen in the process chamber, and monitoring a condition of the plasma with an ion mobility spectrometer is also provided.
Public/Granted literature
- US20100062547A1 TECHNIQUE FOR MONITORING AND CONTROLLING A PLASMA PROCESS WITH AN ION MOBILITY SPECTROMETER Public/Granted day:2010-03-11
Information query
IPC分类:
