Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US12853030Application Date: 2010-08-09
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Publication No.: US08344341B2Publication Date: 2013-01-01
- Inventor: Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
- Applicant: Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP02257822 20021112; EP03253692 20030611
- Main IPC: G01N21/86
- IPC: G01N21/86 ; A61N5/00 ; G03B27/42

Abstract:
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
Public/Granted literature
- US20110027721A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2011-02-03
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