Invention Grant
- Patent Title: Graphene transistor with a self-aligned gate
- Patent Title (中): 具有自对准栅极的石墨烯晶体管
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Application No.: US12876454Application Date: 2010-09-07
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Publication No.: US08344358B2Publication Date: 2013-01-01
- Inventor: Phaedon Avouris , Damon B. Farmer , Yu-Ming Lin , Yu Zhu
- Applicant: Phaedon Avouris , Damon B. Farmer , Yu-Ming Lin , Yu Zhu
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A graphene-based field effect transistor includes source and drain electrodes that are self-aligned to a gate electrode. A stack of a seed layer and a dielectric metal oxide layer is deposited over a patterned graphene layer. A conductive material stack of a first metal portion and a second metal portion is formed above the dielectric metal oxide layer. The first metal portion is laterally etched employing the second metal portion, and exposed portions of the dielectric metal oxide layer are removed to form a gate structure in which the second metal portion overhangs the first metal portion. The seed layer is removed and the overhang is employed to shadow proximal regions around the gate structure during a directional deposition process to form source and drain electrodes that are self-aligned and minimally laterally spaced from edges of the gate electrode.
Public/Granted literature
- US20120056161A1 GRAPHENE TRANSISTOR WITH A SELF-ALIGNED GATE Public/Granted day:2012-03-08
Information query
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