Invention Grant
- Patent Title: Semiconductor device and method
- Patent Title (中): 半导体器件及方法
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Application No.: US12750151Application Date: 2010-03-30
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Publication No.: US08344472B2Publication Date: 2013-01-01
- Inventor: Vishnu K. Khemka , Tahir A. Khan , Weixiao Huang , Ronghua Zhu
- Applicant: Vishnu K. Khemka , Tahir A. Khan , Weixiao Huang , Ronghua Zhu
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
Transistors (21, 41) employing floating buried layers may be susceptible to noise coupling into the floating buried layers. In IGFETS this is reduced or eliminated by providing a normally-ON switch (80, 80′) coupling the buried layer (102, 142, 172, 202) and the IGFET source (22, 42) or drain (24, 44). When the transistor (71, 91) is OFF, this clamps the buried layer voltage and substantially prevents noise coupling thereto. When the drain-source voltage VDS exceeds the switch's (80, 80′) threshold voltage Vt, it turns OFF, allowing the buried layer (102, 142, 172, 202) to float, and thereby resume normal transistor action without degrading the breakdown voltage or ON-resistance. In a preferred embodiment, a normally-ON lateral JFET (801, 801′, 801-1, 801-2, 801-3) conveniently provides this switching function. The lateral JFET (801-3) can be included in the device (70, 70′, 90, 90′) by mask changes without adding or customizing any process steps, thereby providing the improved noise resistance without significant increase in manufacturing cost. The improvement applies to both P (90-1) and N channel (70-1, 70-2, 70-3) transistors and is particularly useful for LDMOS devices.
Public/Granted literature
- US20110241083A1 SEMICONDUCTOR DEVICE AND METHOD Public/Granted day:2011-10-06
Information query
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