Invention Grant
- Patent Title: Inductors having inductor axis parallel to substrate surface
- Patent Title (中): 电感器的电感轴平行于衬底表面
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Application No.: US12605010Application Date: 2009-10-23
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Publication No.: US08344478B2Publication Date: 2013-01-01
- Inventor: Joseph P. Ellul , Khanh Tran , Edward Martin Godshalk , Albert Bergemont
- Applicant: Joseph P. Ellul , Khanh Tran , Edward Martin Godshalk , Albert Bergemont
- Applicant Address: US CA San Jose
- Assignee: Maxim Integrated Products, Inc.
- Current Assignee: Maxim Integrated Products, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L29/86

Abstract:
Inductors and methods for integrated circuits that result in inductors of a size compatible with integrated circuits, allowing the fabrication of inductors, with or without additional circuitry on a first wafer and the bonding of that wafer to a second wafer without wasting of wafer area. The inductors in the first wafer are comprised of coils formed by conductors at each surface of the first wafer coupled to conductors in holes passing through the first wafer. Various embodiments are disclosed.
Public/Granted literature
- US20110095395A1 Inductors and Methods for Integrated Circuits Public/Granted day:2011-04-28
Information query
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