Invention Grant
US08344492B2 Semiconductor device and method of manufacturing the same, and electronic apparatus 有权
半导体装置及其制造方法以及电子设备

Semiconductor device and method of manufacturing the same, and electronic apparatus
Abstract:
A first multilayer wiring structure has a first surface and a second surface positioned on an opposite side to the first surface, a first wiring pattern formed on the second surface side and a housing portion penetrating through the first multilayer wiring structure from the first surface to the second surface. An electronic component has an electrode pad. The electronic component is accommodated in the housing portion in a state that an electrode pad formation surface at the side where the electrode pad is formed is positioned on the second surface side of the first multilayer wiring structure. A second multilayer wiring structure has an insulating layer and a second wiring pattern which are stacked on the second surface of the first multilayer wiring structure and the electrode pad formation surface of the electronic component. The second wiring pattern is electrically connected to the first wiring pattern and the electrode pad.
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