Invention Grant
- Patent Title: Integrated circuit devices including air spacers separating conductive structures and contact plugs and methods of fabricating the same
- Patent Title (中): 集成电路装置包括分隔导电结构和接触插塞的气垫片及其制造方法
-
Application No.: US13469434Application Date: 2012-05-11
-
Publication No.: US08344517B2Publication Date: 2013-01-01
- Inventor: Dae-Ik Kim , Je-Min Park , Chang-Suk Hyun
- Applicant: Dae-Ik Kim , Je-Min Park , Chang-Suk Hyun
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2009-0040800 20090511
- Main IPC: H01L21/4763
- IPC: H01L21/4763

Abstract:
An integrated circuit device includes first and second conductive structures spaced apart from one another on a substrate along a first direction. The first and second conductive structures extend in a second direction substantially perpendicular to the first direction. A contact plug is interposed between the first and second conductive structures and is separated therefrom along the first direction by respective air gaps on opposite sides of the contact plug. The air gaps define first and second air spacers that electrically insulate the contact plug from the first and second conductive structures, respectively. An upper insulation layer covers the first and second air spacers and the first and second conductive structures. The air spacers may sufficiently reduce the loading capacitance between the conductive structures. Related fabrication methods are also discussed.
Public/Granted literature
Information query
IPC分类: