Improved power distribution architectures for the uniform delivery of single frequency RF power to plasma chambers are disclosed. The architectures include feeding into multiple points across a single large-area electrode, multiple electrodes driving a common plasma discharge as well as multiple coils driving a common plasma discharge. The time-averaged electromagnetic field distribution may be controlled using an array of generator and match (delivery) systems, one of which may be capable of absorbing net power and presenting controlled impedance to the plasma load. In variations, an M+N port network (with M the number of generators and N the number of feed points on the electrode) may be implemented to level the power required from each generator while maintaining a desired field strength distribution.