Invention Grant
- Patent Title: Indium tin oxide gate charge coupled device
- Patent Title (中): 铟锡氧化物栅极电荷耦合器件
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Application No.: US12759472Application Date: 2010-04-13
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Publication No.: US08345134B2Publication Date: 2013-01-01
- Inventor: Joseph T. Smith , Bron R. Frias , Paul A. Tittel , Robert R. Shiskowski , Nathan Bluzer
- Applicant: Joseph T. Smith , Bron R. Frias , Paul A. Tittel , Robert R. Shiskowski , Nathan Bluzer
- Applicant Address: US VA Falls Church
- Assignee: Northrop Grumman Systems Corporation
- Current Assignee: Northrop Grumman Systems Corporation
- Current Assignee Address: US VA Falls Church
- Agency: Tarolli, Sundheim, Covell & Tummino LLP
- Main IPC: H04N5/335
- IPC: H04N5/335 ; H01L27/148 ; H01L21/00

Abstract:
An Indium Tin Oxide (ITO) gate charge coupled device (CCD) is provided. The CCD device comprises a CCD structure having a substrate layer, an oxide layer over the substrate layer, a nitride layer over the oxide layer and a plurality of parallel ITO gates extending over the nitride layer. The CCD device further comprises a plurality of substantially similarly sized channel stop regions in the substrate layer that extend transversely relative to the ITO gates, such that a given pair of channel stop regions defining a pixel column of the CCD structure. The CCD device also comprises a plurality of vent openings that extend through the nitride layer along the plurality of substantially similarly sized channel stop regions to allow for penetration of hydrogen to at least one of the oxide layer and the substrate layer.
Public/Granted literature
- US20110249160A1 INDIUM TIN OXIDE GATE CHARGE COUPLED DEVICE Public/Granted day:2011-10-13
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