Invention Grant
- Patent Title: Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
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Application No.: US11398572Application Date: 2006-04-06
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Publication No.: US08345216B2Publication Date: 2013-01-01
- Inventor: Atsushi Ohta , Takashi Horiuchi
- Applicant: Atsushi Ohta , Takashi Horiuchi
- Applicant Address: JP Tokyo JP Katta-Gun
- Assignee: Nikon Corporation,Zao Nikon Co., Ltd
- Current Assignee: Nikon Corporation,Zao Nikon Co., Ltd
- Current Assignee Address: JP Tokyo JP Katta-Gun
- Agency: Oliff & Berridge, PLC
- Priority: JPP2003-349550 20031008
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.
Public/Granted literature
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