Invention Grant
- Patent Title: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
- Patent Title (中): 浸渍光刻设备，干燥装置，沉浸式计量装置及装置制造方法
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Application No.: US12437466Application Date: 2009-05-07
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Publication No.: US08345218B2Publication Date: 2013-01-01
- Inventor: Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
- Applicant: Michel Riepen , Nicolaas Rudolf Kemper , Johannes Petrus Martinus Bernardus Vermeulen , Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Arnold Jan Van Putten
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.
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