Invention Grant
US08345223B2 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
有权
光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件
- Patent Title: Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
- Patent Title (中): 光学元件，包括这种光学元件的光刻设备，器件制造方法以及由此制造的器件
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Application No.: US12919741Application Date: 2009-02-24
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Publication No.: US08345223B2Publication Date: 2013-01-01
- Inventor: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
- Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2009/001299 WO 20090224
- International Announcement: WO2009/106291 WO 20090903
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G02B27/14
Abstract:
An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.
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