中科微点-全球专利检索

  1. Login
  2. Sign Up
Invention Grant
US08345263B2 Measurement method and measurement apparatus that measure a surface figure of an aspheric surface based on an interference pattern 失效
基于干涉图案测量非球面的表面图形的测量方法和测量装置

  • Patent Title: Measurement method and measurement apparatus that measure a surface figure of an aspheric surface based on an interference pattern
  • Patent Title (中): 基于干涉图案测量非球面的表面图形的测量方法和测量装置
  • Application No.: US12633107
    Application Date: 2009-12-08
  • Publication No.: US08345263B2
    Publication Date: 2013-01-01
  • Inventor: Akihiro Nakauchi
  • Applicant: Akihiro Nakauchi
  • Applicant Address: JP Tokyo
  • Assignee: Canon Kabushiki Kaisha
  • Current Assignee: Canon Kabushiki Kaisha
  • Current Assignee Address: JP Tokyo
  • Agency: Canon USA, Inc., IP Division
  • Priority: JP2008-321476 20081217; JP2008-321477 20081217
  • Main IPC: G01B11/02
  • IPC: G01B11/02
Measurement method and measurement apparatus that measure a surface figure of an aspheric surface based on an interference pattern
Abstract:
The present invention provides a measurement apparatus that illuminates a surface to be tested having an aspheric surface using light beams that form spherical waves to measure a figure of the surface to be tested, including a detection unit configured to detect interference patterns between light beams from the surface to be tested and light beams from a reference surface, and a controller configured to control processing for obtaining a figure of the surface to be tested based on the interference patterns detected by the detection unit.
Abstract(Chinese):

本发明提供一种测量装置，其使用形成球面波的光束照射具有非球面的待测试表面，以测量待测试表面的图形，包括检测单元，其被配置为检测来自所述待测试的光束的光束之间的干涉图案 待测试表面和来自参考表面的光束;以及控制器，被配置为基于由检测单元检测到的干涉图案来控制用于获得待测试表面的图形的处理。

Public/Granted literature
Information query
Espacenet
Patent Agency Ranking
0/0