Invention Grant
US08345265B2 Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device
有权
用于补偿衬底不平坦度的光刻设备和方法，确定图案形成装置不平坦度的影响，以及确定热负荷对图案形成装置的影响
- Patent Title: Lithographic apparatus and methods for compensating substrate unflatness, determining the effect of patterning device unflatness, and determining the effect of thermal loads on a patterning device
- Patent Title (中): 用于补偿衬底不平坦度的光刻设备和方法，确定图案形成装置不平坦度的影响，以及确定热负荷对图案形成装置的影响
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Application No.: US12616185Application Date: 2009-11-11
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Publication No.: US08345265B2Publication Date: 2013-01-01
- Inventor: Dirk-Jan Bijvoet
- Applicant: Dirk-Jan Bijvoet
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/24
- IPC: G01B11/24
Abstract:
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor configured to measure a height level, curvature and/or angle of a surface of a patterning device supported on the support.
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