Invention Grant
US08345342B2 Multilayer structure having a photochromic host matrix and manufacturing method
有权
具有光致变色主体矩阵的多层结构及其制造方法
- Patent Title: Multilayer structure having a photochromic host matrix and manufacturing method
- Patent Title (中): 具有光致变色主体矩阵的多层结构及其制造方法
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Application No.: US13003425Application Date: 2009-07-10
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Publication No.: US08345342B2Publication Date: 2013-01-01
- Inventor: Umberto Rossini , Anthony Saugey
- Applicant: Umberto Rossini , Anthony Saugey
- Applicant Address: FR Neuilly sur Seine FR Charenton-le-Pont
- Assignee: Thales,Essilor International (Compagnie Generale d'Optique)
- Current Assignee: Thales,Essilor International (Compagnie Generale d'Optique)
- Current Assignee Address: FR Neuilly sur Seine FR Charenton-le-Pont
- Agency: Baker & Hostetler LLP
- Priority: FR0803981 20080711
- International Application: PCT/EP2009/058800 WO 20090710
- International Announcement: WO2010/004021 WO 20100114
- Main IPC: G02F1/03
- IPC: G02F1/03

Abstract:
A photochromic structure includes a plastic support of optical grade with good light transparency, having at least one face with an adhesive layer impregnated with a solution of a solvent with photochromes, having a flexible host matrix for the photochromes, which is mounted by adhesion onto another support. A structure with a uniform flexible photochromic matrix, which has rapid transition times, notably a rapid relaxation time, is thus obtained. The structure is mountable, and advantageously repositionable. It is produced via a process using roll-milling combined with a system for dispensing the solvated solution of photochromes upstream of the rolls, via which a support strip of an adhesive is entrained by the rolls, and the adhesive is gradually impregnated and then laminated on another support.
Public/Granted literature
- US20110116151A1 MULTILAYER STRUCTURE HAVING A PHOTOCHROMIC HOST MATRIX AND MANUFACTURING METHOD Public/Granted day:2011-05-19
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