Invention Grant
- Patent Title: Polarization-maintaining reflector arrangement
- Patent Title (中): 偏振维持反射器布置
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Application No.: US12496439Application Date: 2009-07-01
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Publication No.: US08345352B2Publication Date: 2013-01-01
- Inventor: Jiangen Pan
- Applicant: Jiangen Pan
- Applicant Address: CN Zhejiang
- Assignee: Everfine Photo-E-Info Co., Ltd.
- Current Assignee: Everfine Photo-E-Info Co., Ltd.
- Current Assignee Address: CN Zhejiang
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: CN200810063060 20080708
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
The present invention discloses a polarization-maintaining reflector arrangement comprising a reflector group including at least one polarizing reflector and at least one compensating reflector, wherein the incident plane for the polarizing reflectors is perpendicular to the incident plane for the compensating reflectors, and the product of s-wave reflectance of all the polarizing reflectors and p-wave reflectance of all the compensating reflectors is equal to the product of s-wave reflectance of all the compensating reflectors and p-wave reflectance of all the polarizing reflectors. One or more reflector groups can be used in the light path. The invention can conveniently and effectively eliminate the polarization caused by reflection.
Public/Granted literature
- US20100007953A1 POLARIZATION-MAINTAINING REFLECTOR ARRANGEMENT Public/Granted day:2010-01-14
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