Invention Grant
- Patent Title: Electrostatic discharge protectors having increased RC delays
- Patent Title (中): 静电放电保护器具有增加的RC延迟
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Application No.: US12719577Application Date: 2010-03-08
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Publication No.: US08345396B2Publication Date: 2013-01-01
- Inventor: Shih-Yu Wang , Chia-Ling Lu , Yu-Lien Liu , Yan-Yu Chen , Che-Shih Lin , Tao-Cheng Lu
- Applicant: Shih-Yu Wang , Chia-Ling Lu , Yu-Lien Liu , Yan-Yu Chen , Che-Shih Lin , Tao-Cheng Lu
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Stout, Uxa, Buyan & Mullins, LLP
- Main IPC: H02H3/22
- IPC: H02H3/22

Abstract:
An RC delay circuit for providing electrostatic discharge (ESD) protection is described. The circuit employs an NMOS transistor and a PMOS transistor to produce a large effective resistance using a relatively small circuit layout area.
Public/Granted literature
- US20110216454A1 ELECTROSTATIC DISCHARGE PROTECTORS HAVING INCREASED RC DELAYS Public/Granted day:2011-09-08
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