Invention Grant
- Patent Title: Resistive memory device and method for fabricating the same
- Patent Title (中): 电阻式存储器件及其制造方法
-
Application No.: US12411455Application Date: 2009-03-26
-
Publication No.: US08345463B2Publication Date: 2013-01-01
- Inventor: Yu-Jin Lee , Yun-Taek Hwang
- Applicant: Yu-Jin Lee , Yun-Taek Hwang
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2008-0072476 20080724
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A resistive memory device includes: a bottom electrode formed over a substrate; and an insulation layer having a hole structure formed over the substrate structure. Herein, the hole structure exposes the bottom electrode, has sidewalls of positive slope, and has a bottom width equal to or smaller than a width of the bottom electrode; a resistive layer formed over the hole structure; and an upper electrode formed over the resistive layer.
Public/Granted literature
- US20100019240A1 RESISTIVE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2010-01-28
Information query