Invention Grant
US08346068B2 Substrate rotating and oscillating apparatus for rapid thermal process
有权
用于快速热处理的基板旋转和振荡装置
- Patent Title: Substrate rotating and oscillating apparatus for rapid thermal process
- Patent Title (中): 用于快速热处理的基板旋转和振荡装置
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Application No.: US12743842Application Date: 2008-11-19
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Publication No.: US08346068B2Publication Date: 2013-01-01
- Inventor: Jang Woo Shim , Sang Seok Lee , Woon Ki Cho , Jun Her
- Applicant: Jang Woo Shim , Sang Seok Lee , Woon Ki Cho , Jun Her
- Applicant Address: KR Gyeonggi-do
- Assignee: Asia Pacific Systems Inc.
- Current Assignee: Asia Pacific Systems Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Occhiuti Rohlicek & Tsao LLP
- Priority: KR10-2007-0119833 20071122
- International Application: PCT/KR2008/006799 WO 20081119
- International Announcement: WO2009/066923 WO 20090528
- Main IPC: F26B3/30
- IPC: F26B3/30 ; F27B5/14

Abstract:
Disclosed is a substrate rotating and oscillating apparatus for a rapid thermal process (RTP), that oscillates an oscillation plate using an oscillation motor moved by an elevating unit. Rotational shafts of the oscillation motor comprise lower and upper center rotational shafts mounted on a central axis of the motor, and an eccentric shaft mounted between the lower and the upper center rotational shafts as deviated from the central axis. An oscillation cam is mounted to the eccentric cam. The oscillation plate has an oscillation hole for inserting the oscillation cam therein. A bearing is mounted between the oscillation cam and the eccentric shaft such that the oscillation cam rotates independently from the eccentric shaft. The oscillation plate supports the whole multipole-magnetized magnetic motor or maglev motor. Accordingly, the substrate can be uniformly heated by both rotating and all-directionally oscillating the substrate.
Public/Granted literature
- US20100322603A1 SUBSTRATE ROTATING AND OSCILLATING APPARATUS FOR RAPID THERMAL PROCESS Public/Granted day:2010-12-23
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