Invention Grant
- Patent Title: Measuring device for measuring a focused laser beam
- Patent Title (中): 用于测量聚焦激光束的测量装置
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Application No.: US12677776Application Date: 2008-09-12
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Publication No.: US08351028B2Publication Date: 2013-01-08
- Inventor: Bernd Zerl , Olaf Kittelmann
- Applicant: Bernd Zerl , Olaf Kittelmann
- Applicant Address: DE Erlangen
- Assignee: Wavelight GmbH
- Current Assignee: Wavelight GmbH
- Current Assignee Address: DE Erlangen
- Agency: Haynes and Boone, LLP
- Priority: EP07017968 20070913
- International Application: PCT/EP2008/007575 WO 20080912
- International Announcement: WO2009/036932 WO 20090326
- Main IPC: G01J1/00
- IPC: G01J1/00

Abstract:
According to an embodiment, a measuring device for measuring a laser beam comprises a magnification lens system with a total of two lenses which are arranged in series in the beam path of the laser beam and whose foci are coinciding, as well as a camera which is arranged behind the two lenses in the focus of the last lens and includes an electronic image sensor which generates an electronic image of the magnified laser beam. The lenses together with the camera are adjustable along the beam path relative to a reference point of the measuring device, for the purpose of locating the beam waist of the laser beam and of determining a diameter profile of the laser beam. The measuring device further comprises an adapter enclosing the beam path for coupling the measuring device to a laser system which provides the laser beam. The adapter forms an abutment surface or the laser system, which is axially directed with respect to a beam axis of the laser beam, and permits the measuring device to be coupled in situ at the installation site of the laser system.
Public/Granted literature
- US20100253937A1 MEASURING DEVICE FOR MEASURING A FOCUSED LASER BEAM Public/Granted day:2010-10-07
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