Invention Grant
- Patent Title: Wavefront-aberration-measuring device and exposure apparatus
- Patent Title (中): 波前像差测量装置和曝光装置
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Application No.: US12683141Application Date: 2010-01-06
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Publication No.: US08351050B2Publication Date: 2013-01-08
- Inventor: Chidane Ouchi
- Applicant: Chidane Ouchi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc., IP Division
- Priority: JP2009-003230 20090109
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01B9/02

Abstract:
A wavefront-aberration-measuring device measures wavefront aberration of a to-be-tested optical system and includes a diffraction grating that splits light transmitted through the optical system, a detecting unit that detects interference fringes produced by beams of the split light, an arithmetic unit that calculates the wavefront aberration from the detected interference fringes, an image-side mask insertable into and retractable from an image plane of the optical system, and an illuminating unit that incoherently illuminates the image-side mask. The image-side mask has an aperture with a diameter larger than λ/2NA, where λ denotes a wavelength of the illuminating unit and NA denotes a numerical aperture of the to-be-tested optical system. The arithmetic unit calculates the wavefront aberration of the optical system from the interference fringes detected with the image-side mask being retracted from the image plane and the interference fringes detected with the image-side mask being in the image plane.
Public/Granted literature
- US20100177323A1 WAVEFRONT-ABERRATION-MEASURING DEVICE AND EXPOSURE APPARATUS Public/Granted day:2010-07-15
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