Invention Grant
- Patent Title: Germanium films by polymer-assisted deposition
- Patent Title (中): 锗膜通过聚合物辅助沉积
-
Application No.: US12558314Application Date: 2009-09-11
-
Publication No.: US08354046B2Publication Date: 2013-01-15
- Inventor: Quanxi Jia , Anthony K. Burrell , Eve Bauer , Filip Ronning , Thomas Mark McCleskey , Guifu Zou
- Applicant: Quanxi Jia , Anthony K. Burrell , Eve Bauer , Filip Ronning , Thomas Mark McCleskey , Guifu Zou
- Applicant Address: US NM Los Alamos
- Assignee: Los Alamos National Security, LLC
- Current Assignee: Los Alamos National Security, LLC
- Current Assignee Address: US NM Los Alamos
- Agent Samuel L. Borkowsky
- Main IPC: H01B1/02
- IPC: H01B1/02

Abstract:
Highly ordered Ge films are prepared directly on single crystal Si substrates by applying an aqueous coating solution having Ge-bound polymer onto the substrate and then heating in a hydrogen-containing atmosphere. A coating solution was prepared by mixing water, a germanium compound, ethylenediaminetetraacetic acid, and polyethyleneimine to form a first aqueous solution and then subjecting the first aqueous solution to ultrafiltration.
Public/Granted literature
- US20100029069A1 GERMANIUM FILMS BY POLYMER-ASSISTED DEPOSITION Public/Granted day:2010-02-04
Information query