Invention Grant
- Patent Title: Resist ink and method of forming pattern using the same
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Application No.: US12612809Application Date: 2009-11-05
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Publication No.: US08354220B2Publication Date: 2013-01-15
- Inventor: Sung-Hee Kim , Byung-Geol Kim
- Applicant: Sung-Hee Kim , Byung-Geol Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2008-0110626 20081107
- Main IPC: G03F7/26
- IPC: G03F7/26
Abstract:
Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.
Public/Granted literature
- US20100119971A1 RESIST INK AND METHOD OF FORMING PATTERN USING THE SAME Public/Granted day:2010-05-13
Information query
IPC分类:
