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US08354662B2 Semiconducting nanoparticles with surface modification 有权
具有表面改性的半导体纳米颗粒

  • Patent Title: Semiconducting nanoparticles with surface modification
  • Patent Title (中): 具有表面改性的半导体纳米颗粒
  • Application No.: US11922790
    Application Date: 2006-06-29
  • Publication No.: US08354662B2
    Publication Date: 2013-01-15
  • Inventor: David Thomas BrittonMargit Härting
  • Applicant: David Thomas BrittonMargit Härting
  • Applicant Address: ZA Cape Town
  • Assignee: PST Sensors, Ltd.
  • Current Assignee: PST Sensors, Ltd.
  • Current Assignee Address: ZA Cape Town
  • Priority: ZA2005/05300 20050630
  • International Application: PCT/IB2006/001788 WO 20060629
  • International Announcement: WO2007/004014 WO 20070111
  • Main IPC: H01L29/66
  • IPC: H01L29/66
Semiconducting nanoparticles with surface modification
Abstract:
The invention relates to semiconducting nanoparticles. The nanoparticles of the invention comprise a single element or a compound of elements in one or more of groups II, III, IV, V, VI. The nanoparticles have a size in the range of 1 nm to 500 nm, and comprise from 0.1 to 20 atomic percent of oxygen or hydrogen. The nanoparticles are typically formed by comminution of bulk high purity silicon. One application of the nanoparticles is in the preparation of inks which can be used to define active layers or structures of semiconductor devices by simple printing methods.
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