Invention Grant
- Patent Title: Lateral insulated-gate bipolar transistor
- Patent Title (中): 侧面绝缘栅双极晶体管
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Application No.: US13226636Application Date: 2011-09-07
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Publication No.: US08354691B2Publication Date: 2013-01-15
- Inventor: Norihito Tokura , Shigeki Takahashi , Youichi Ashida , Akio Nakagawa
- Applicant: Norihito Tokura , Shigeki Takahashi , Youichi Ashida , Akio Nakagawa
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2010-202188 20100909; JP2011-149210 20110705
- Main IPC: H01L29/739
- IPC: H01L29/739

Abstract:
A N-channel lateral insulated-gate bipolar transistor includes a semiconductor substrate, a drift layer, a collector region, a channel layer, an emitter region, a gate insulation film, a gate electrode, a collector electrode, an emitter electrode. The collector region includes a high impurity concentration region having a high impurity concentration and a low impurity concentration region having a lower impurity concentration than the high impurity concentration region. The collector electrode is in ohmic contact with the high impurity concentration region and in schottky contact with the low impurity concentration region.
Public/Granted literature
- US20120061726A1 LATERAL INSULATED-GATE BIPOLAR TRANSISTOR Public/Granted day:2012-03-15
Information query
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