Invention Grant
- Patent Title: Cylindrical magnetic levitation stage
- Patent Title (中): 圆柱磁悬浮台
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Application No.: US13001752Application Date: 2008-09-29
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Publication No.: US08354908B2Publication Date: 2013-01-15
- Inventor: Jeong Woo Jeon , Hyun Seok Oh , Sung Il Chung , Yeon Ho Jeong , Do Hyun Kang , S. A. Nikiforov , Mitica Caraiani
- Applicant: Jeong Woo Jeon , Hyun Seok Oh , Sung Il Chung , Yeon Ho Jeong , Do Hyun Kang , S. A. Nikiforov , Mitica Caraiani
- Applicant Address: KR Gyeongsangnam-do
- Assignee: Korea Electrotechnology Research Institute
- Current Assignee: Korea Electrotechnology Research Institute
- Current Assignee Address: KR Gyeongsangnam-do
- Agency: Frommer Lawrence & Haug LLP
- Agent Ronald R. Santucci
- Priority: KR10-2008-0065102 20080704
- International Application: PCT/KR2008/005733 WO 20080929
- International Announcement: WO2010/002071 WO 20100107
- Main IPC: H01F7/00
- IPC: H01F7/00
Abstract:
The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.
Public/Granted literature
- US20110234343A1 Cylindrical Magnetic Levitation Stage Public/Granted day:2011-09-29
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