Invention Grant
- Patent Title: Alignment system
- Patent Title (中): 校准系统
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Application No.: US12951359Application Date: 2010-11-22
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Publication No.: US08354958B2Publication Date: 2013-01-15
- Inventor: Gilbert M. Shows , Jacob Kim
- Applicant: Gilbert M. Shows , Jacob Kim
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Pierce Atwood LLP
- Agent Joseph M. Maraia
- Main IPC: H01Q3/00
- IPC: H01Q3/00

Abstract:
An apparatus for determining alignment of a first subsystem relative to a second subsystem. The apparatus includes a first antenna system for simultaneously transmitting a delta pattern radiation beam at a first frequency and a sum pattern radiation beam at a second frequency. The apparatus also includes a second antenna system for receiving the delta pattern radiation beam at the first frequency and the sum pattern radiation beam at the second frequency. The apparatus also includes a processor to process the received delta pattern radiation beam and sum pattern radiation beam to determine if a predetermined alignment criterion between the first antenna system and the second antenna system is satisfied.
Public/Granted literature
- US20120127033A1 ALIGNMENT SYSTEM Public/Granted day:2012-05-24
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