Invention Grant
- Patent Title: Positioning system, method, and lithographic apparatus
- Patent Title (中): 定位系统,方法和光刻设备
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Application No.: US12576079Application Date: 2009-10-08
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Publication No.: US08355115B2Publication Date: 2013-01-15
- Inventor: Robertus Leonardus Tousain , Martijn Robert Hamers , Jeroen Arnoldus Leonardus Johannes Raaymakers
- Applicant: Robertus Leonardus Tousain , Martijn Robert Hamers , Jeroen Arnoldus Leonardus Johannes Raaymakers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
A lithographic apparatus includes a positioner configured to position a first part of the apparatus relative to a second part of the apparatus, the positioner including a motor having a motor position dependent motor constant defining a relation between a motor input and a motor output, and a control system to drive the motor, the control system including a set-point generator to provide a reference signal based on a desired position of the first part relative to the second part, and a controller to provide a drive signal to the motor based on the reference signal, wherein the controller includes a compensator which is configured to at least partially compensate the drive signal for the motor position dependent motor constant. The invention further relates to a positioner, a method to optimize the positioning system, and a method to derive a motor position dependent motor constant.
Public/Granted literature
- US20100091262A1 POSITIONING SYSTEM, METHOD, AND LITHOGRAPHIC APPARATUS Public/Granted day:2010-04-15
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