Invention Grant
US08355810B2 Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility
有权
用于估计半导体制造设施中的运行控制的上下文偏移的方法和系统
- Patent Title: Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility
- Patent Title (中): 用于估计半导体制造设施中的运行控制的上下文偏移的方法和系统
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Application No.: US12362384Application Date: 2009-01-29
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Publication No.: US08355810B2Publication Date: 2013-01-15
- Inventor: Jianping Zou
- Applicant: Jianping Zou
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility is described. In one embodiment, contexts associated with a process are identified. The process has one or more threads, and each thread involves one or more contexts. A set of input-output equations describing the process is defined. Each input-output equation corresponds to a thread and includes a thread offset expressed as a summation of individual context offsets. A state-space model is created that describes an evolution of the process using the set of input-output equations. The state-space model allows to estimate individual context offsets.
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