Invention Grant
US08356494B2 Process for producing porous quartz glass object, and optical member for EUV lithography
失效
用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件
- Patent Title: Process for producing porous quartz glass object, and optical member for EUV lithography
- Patent Title (中): 用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件
-
Application No.: US13210673Application Date: 2011-08-16
-
Publication No.: US08356494B2Publication Date: 2013-01-22
- Inventor: Takahiro Mitsumori , Yasutomi Iwahashi , Akio Koike
- Applicant: Takahiro Mitsumori , Yasutomi Iwahashi , Akio Koike
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-040455 20090224
- Main IPC: C03B37/018
- IPC: C03B37/018 ; C03C3/06

Abstract:
A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.
Public/Granted literature
- US20110301015A1 PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY Public/Granted day:2011-12-08
Information query