Invention Grant
- Patent Title: Maintenance method for liquid ejecting apparatus
- Patent Title (中): 液体喷射装置的维护方法
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Application No.: US13015101Application Date: 2011-01-27
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Publication No.: US08356876B2Publication Date: 2013-01-22
- Inventor: Atsushi Yoshida
- Applicant: Atsushi Yoshida
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2010-020221 20100201
- Main IPC: B41J29/393
- IPC: B41J29/393

Abstract:
There is a first process of pressurizing the liquid introduced into the discharge pipe by driving a pump device and transferring the liquid to one end side of the discharge pipe; a second process of applying an electric field between a liquid reception unit, which is disposed to face the surface of the nozzle openings of the liquid ejecting head in a non-contact state, communicates with the other end side of the discharge pipe and is ejected with liquid from the nozzles, and the surface of the nozzle openings; a third process of detecting a change in voltage based on electrostatic induction when the pressurizing of the liquid in the discharge pipe due to the pump device is released; and a fourth process of detecting the discharge state of the liquid from the discharge pipe on the basis of detection result of the change in voltage.
Public/Granted literature
- US20110187790A1 MAINTENANCE METHOD FOR LIQUID EJECTING APPARATUS Public/Granted day:2011-08-04
Information query
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