Invention Grant
US08357483B2 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin 有权
包含通过使用大分子单体作为碱溶性树脂制备的聚合物的感光树脂组合物

Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
Abstract:
The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
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