Invention Grant
US08357483B2 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
有权
包含通过使用大分子单体作为碱溶性树脂制备的聚合物的感光树脂组合物
- Patent Title: Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin
- Patent Title (中): 包含通过使用大分子单体作为碱溶性树脂制备的聚合物的感光树脂组合物
-
Application No.: US12450661Application Date: 2008-04-11
-
Publication No.: US08357483B2Publication Date: 2013-01-22
- Inventor: Han-Soo Kim , Min-Young Lim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim , Kwang-Han Park
- Applicant: Han-Soo Kim , Min-Young Lim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim , Kwang-Han Park
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2007-0035389 20070411
- International Application: PCT/KR2008/002055 WO 20080411
- International Announcement: WO2008/127036 WO 20081023
- Main IPC: G03F7/033
- IPC: G03F7/033 ; G03F7/032 ; G03F7/037 ; C08F224/00

Abstract:
The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
Public/Granted literature
Information query
IPC分类: