Invention Grant
- Patent Title: Inspection method and apparatus
- Patent Title (中): 检验方法和装置
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Application No.: US12955550Application Date: 2010-11-29
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Publication No.: US08357536B2Publication Date: 2013-01-22
- Inventor: Sander Frederik Wuister
- Applicant: Sander Frederik Wuister
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01N31/22
- IPC: G01N31/22 ; G01N33/44 ; G01N21/64

Abstract:
In an embodiment, there is disclosed an inspection method for detecting the presence of imprintable medium on an imprint lithography template. The method includes contacting the imprint lithography template with a marker, the marker being attachable to imprintable medium that may be on the imprint lithography template, the marker being configured to interact with incident radiation when attached to the imprintable medium, directing radiation at the imprint lithography template, and measuring radiation re-directed by the imprint lithography template to attempt to detect presence of a marker that has attached to the imprintable medium, from the interaction of the marker with the incident radiation, and thus detect the presence of imprintable medium to which the marker is attached.
Public/Granted literature
- US20110129930A1 INSPECTION METHOD AND APPARATUS Public/Granted day:2011-06-02
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