Invention Grant
- Patent Title: Laser annealing method and laser annealing apparatus
- Patent Title (中): 激光退火方法和激光退火装置
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Application No.: US12574024Application Date: 2009-10-06
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Publication No.: US08357620B2Publication Date: 2013-01-22
- Inventor: Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
- Applicant: Katsuji Takagi , Akio Machida , Toshio Fujino , Tadahiro Kono , Norio Fukasawa , Shinsuke Haga
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JP2008-263561 20081010
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An embodiment of the invention provides a laser annealing method, including the steps of radiating a laser beam to an amorphous film on a substrate while scanning the laser beam for the amorphous film, crystallizing the amorphous film, detecting a light quantity of laser beam reflected from the substrate and a scanning speed of the laser beam while the radiation and the scanning of the laser beam are carried out for the amorphous film, and controlling a radiation level and the scanning speed of the laser beam based on results of comparison of the light quantity of laser beam reflected from the substrate, and the scanning speed of the laser beam with respective preset references.
Public/Granted literature
- US20100093112A1 LASER ANNEALING METHOD AND LASER ANNEALING APPARATUS Public/Granted day:2010-04-15
Information query
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