Invention Grant
- Patent Title: Radio frequency power supply
- Patent Title (中): 射频电源
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Application No.: US12178372Application Date: 2008-07-23
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Publication No.: US08357874B2Publication Date: 2013-01-22
- Inventor: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck
- Applicant: Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck
- Applicant Address: DE Freiburg
- Assignee: Huettinger Elektronik GmbH + Co. KG
- Current Assignee: Huettinger Elektronik GmbH + Co. KG
- Current Assignee Address: DE Freiburg
- Agency: Fish & Richardson P.C.
- Priority: WOPCT/EP2008/004651 20080611
- Main IPC: B23K10/00
- IPC: B23K10/00

Abstract:
A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.
Public/Granted literature
- US20090026181A1 RADIO FREQUENCY POWER SUPPLY Public/Granted day:2009-01-29
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