Invention Grant
- Patent Title: Spin transistor and method of manufacturing the same
- Patent Title (中): 旋转晶体管及其制造方法
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Application No.: US12700767Application Date: 2010-02-05
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Publication No.: US08357962B2Publication Date: 2013-01-22
- Inventor: Takao Marukame , Mizue Ishikawa , Tomoaki Inokuchi , Hideyuki Sugiyama , Yoshiaki Saito
- Applicant: Takao Marukame , Mizue Ishikawa , Tomoaki Inokuchi , Hideyuki Sugiyama , Yoshiaki Saito
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-028943 20090210
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A spin transistor includes a source electrode, a drain electrode, and a gate electrode on a semiconductor substrate. At least one of the source electrode and the drain electrode includes a semiconductor region and a magnetic layer. The semiconductor region is formed in the semiconductor substrate. The magnetic layer is formed on the semiconductor region, and contains a crystalline Heusler alloy containing at least one of cobalt (Co) and iron (Fe). The semiconductor region and the magnetic layer contain the same impurity element.
Public/Granted literature
- US20100200899A1 SPIN TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-08-12
Information query
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